Have your design ideas in Excel, Power Point or napkin? We accept all of the above.
We provide on-screen layout service from our office in Pasadena, CA. Or we can travel to your place of business. Our software is portable and loaded on a powerful laptop that can handle any design.
If you need calibration plates or test patterns such as ronchi patterns or USAF patterns we can layout and order the photomasks. It is important to understand the relationship between grid and specs when laying out calibration plates so that the plates themselves don't give false results.
We have the ability to do data-culling on your features and then perform edits on just those features. For example, we can identify VIAs on the edge of a pattern and size them separately from the other VIAs. Using these techniques we can create simple OPC features.
CMP fill patterns, metal holes or similar can be automatically placed in your data using our rules based custom scripts.
Common data issues can be automatically fixed using our suite of custom scripts. Fixes such as data-on-data, self-intersecting polygons, unexploded text and zero width paths can all be fixed efficiently.
Boolean functions can be used to merge layers, create layers, cut holes in layers. An example would be automatic VIA layer generation.
We can perform sizing on layers, structures (cells), features or groups. We can also do scaling such as design shrink.
Reticle engineering is the process that can include frame generation, stepper optimization for speed or yield and the addition of reticle alignment marks, titles and barcodes. Digidat has engineered reticles for all the common stepper types and have templates for all Nikon, Canon, ASML, GCA and Ultratech tools.
We create scribes for steppers, scanners and aligners. With your input, we place fine/coarse wafer alignment marks, search marks, process monitors, KLA marks and CD marks. We also create the paperwork that specifies the locations of all the marks so that the stepping tool can be correctly programmed..
Attenuated Phase-shift photomasks have a layer of MoSi film that is semi-transparent, the light that passes through this layer interferes with the adjacent light coming through a clear area and sharpens the image. Digidat has created data for many EASPMs. EASPMs are typically used for 300nm features or smaller.
Fast turn photomasks are available for 24 hour, or 48 hour turns for all our standard photomasks.
We supply binary photomasks from 4" square to 9" square from multiple vendors, with minimum feature sizes down to 200nm on the mask. We support all 1x, 2x, 4x, 5x and 10x steppers/scanners/aligners . We will find the right photomask so that you don't need to worry whether it is over priced or under spec'd for your application.
We offer a protective Teflon coating that can be added to the surface of a 1x contact mask. This protects the chrome and glass from holes and pits as well as makes the masks easier to clean.
Pellicles can be added to all projection masks from 1x to 10x. We have pellicles for all the common steppers, scanners and aligners including Nikon, Canon, ASML, GCA and Ultratech.
All data is run through our MaskCheck© program before being committed to photomask. The program checks for common data issues such as zero width lines, unexploded text, self-intersections etc. We will also supply plots of the photomask to ensure that polarity, parity, titles and critical dimensions are correct.
Once your design is complete it is often too complex to check manually. A DRC run will ensure that your data complies with your design rules.
Die numbering is important so that die location on the wafer can be identified. This can help with yield issue in production. Die numbering can also be important when you need to identify slightly different designs on the wafer. We can serialize your die even if there are different die sizes and patterns.
Exploding GDSII data is the process of removing hierarchy. This is often necessary to perform certain rules based edits such as sizing or Boolean functions. We also have the rare ability to re-generate hierarchy from flat data using a custom built program, this way post-processed GDSII files can be made manageable.
We create grayscale data using a dot matrix approach. A test will need to be performed to identify the correct pixel size and density for your process. Once established we can create a full range of grayscale data. We can also create grayscale from bmp files.
Random dots, meshes, grids, lines - we can create what you need over any area you need. These types of patterns are often used in military or optical laser applications.
We can generate algorithm or rules based patterns. Smooth spirals, test patterns of varying size and magnification, wave guides, CGHs or data from Excel sheets can be generated into photomask ready GDSII data.
We have worked with several Solar Power companies to draw their designs. It makes far more sense for companies with relatively simple designs to out-source their CAD work rather than pay for an expensive software suite.
Photonics requires careful generation of waveguides so that they are smooth. We have a waveguide generation program that can create waveguides of any shape.
We have worked with many companies to draw their MEMS designs. We can take designs from Solid Works or draw them from scratch. MEMS requires special attention to alignment schemes that often utilize backside masks, multiple bonded wafers and have deep etches. We have worked with customers and foundries to create alignment schemes that work.
Layout in the medical field often comprises of large arrays of patterns that will choke up software such as AutoCAD. Whether the patterns are geometric, random or placed using formulae, Digidat can draw them and have the data ready for photomask.
Another area that we serve is the LCD and IR Sensor industry. We are experienced with the layout requirements of these devices.
CMOS, Bi-Polar, GaN, Gaas, it doesn't matter to us what materials you use or how many layers you have. We can do layout for Memory Arrays, Power Devices, RF, Analog, Digital and Mixed Signal.